LTL in Etcheverry Hall
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Location and Workspace
Total working area: 2,000 sq. ft. - Offices (#5144, at Etcheverry Hall) - Lab. (#5115, #6162, #6186, at Etcheverry Hall) |
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Equipment
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Lasers
1. Spectra-Physics/Newport Femtosecond Laser including: a) Tsunami diode pumped laser pumped mode-locked Ti:Sapphire oscillator <50 fs, tunable 720-850 nm. b) Empower Nd:YLF pump laser for the regenerative amplifier, c) Spitfire tunable Ti:Sapphire regenerative amplifier, ~1 mJ/pulse @ 1 kHz, 800 nm, <80 fs pulse duration. d) 2ω and 3ω harmonics and an Optical Parametric Amplifier, tunable 1.1-3 µm, <130 fs. 2. IMRA FCPA Jewel D-400 fiber femtosecond laser, 650 nJ per pulse @ 1 MHz, 5 µJ per pulse @ 100 kHz, λ = 1,054 nm. 3. TOPTICA FemtoFiber pro NIR laser, (1560 nm and 780 nm) 100 fs pulse width, 140 mW @ 780 nm. 4. Continuum Surelite II-10 Nd:YAG laser, (10 Hz, 7 ns FWHM, 650 mJ @ 1064 nm, 300 mJ @ 532 nm, 100 mJ@ 355 nm, 80 mJ @ 266 nm). 5. Spectra Physics Navigator high frequency nanosecond laser 40 ns pulse duration at 20 kHz (200 kHz maximum frequency) with the following harmonics: 18 W @ 1064 nm, 9 W @ 532 nm, 3.5 W @ 355 nm. 6. Tempest-10 New Wave Nd:YAG pulsed laser (10 Hz, 7 ns FWHM, 200 mJ @ 1064 nm, 100 mJ @ 532 nm, 50 mJ @ 355 nm, 30 mJ @ 266 nm). 7. New Wave Polaris III-10 Nd:YAG pulsed laser, 90 mJ @ 1,064 nm, 50 mJ @ 532 nm. 8. Coherent Innova 90C-A6 Ar-ion laser, 6 W multi-line, 2.40 W @ 514.5 nm. 9. Synrad 48-2 CO2 laser, 25 W @ 10.6 μm. 10. Lighthouse Sprout-G-5 W DPSS laser, 5 W @ 532 nm. 11. Lighthouse Sprout-C-4 W DPSS laser, 4 W @ 532 nm. 12. QI-Optiq diode lasers @ 405 and 800 nm. 13. Passat Compiler 355 ps laser, 160 µJ/pulse, 400 Hz, @ 355 nm. 14. Kimmon IK He-Cd laser 25 mW @ 325 nm. 15. Surelite UV Nd:YAG laser, 4 mJ @ 213 nm. The lasers are coupled into precision motion systems, including Aerotech 3D workstations (four systems), one PI 3D piezo nano-positioning system, one SCANLAB scanner, one Hamamatsu Spatial Light Modulator, various detectors, photon counters, several fast cameras and pulsed light sources. |
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AFM Instruments
16. XE-100 AFM/NSOM system from Park Instruments. 17. Vistascope AFM system from Molecular Vista. |
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Diagnostics
18. Renishaw inVia Basis Raman system.
19. Gated ICCD camera, <2 ns minimum gate width and an Imaging Spectrograph and Monochromator for spectroscopic studies from Princeton Instruments.
18. Renishaw inVia Basis Raman system.
19. Gated ICCD camera, <2 ns minimum gate width and an Imaging Spectrograph and Monochromator for spectroscopic studies from Princeton Instruments.
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Microscopes
20. Olympus IX71 inverted and BX43 upright microscopes. |
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Other Equipment
21. Semiconductor analyzer for device measurements.
22. Solar cell simulator for solar cell evaluation.
23. Lindberg nanowire growth furnace.
24. Carbon nanotube (CNT) growth furnace.
25. 12-bit FASTCAM high speed camera, 1,280X1,024 pixels @ 2,000 fps, 640X240 pixels @ 10,000 fps.
Experimental Setups at LTL include:
26. Amplified femtosecond laser-based micromachining system.
27. High repetition rate ultrafast laser micromachining.
28. Multi-photon polymerization apparatus.
29. Optical emission spectroscopy, Rayleigh scattering spectroscopy, laser-induced-fluorescence (LIF) for nanosecond and femtosecond laser materials interactions.
30. Pump-and-Probe ultra-fast optical diagnostics and time-resolved imaging.
31. AFM coupled with the femtosecond laser for apertureless NSOM nanomachining and imaging.
32. AFM/NSOM second harmonic generation (SHG), Photon-induced Force Microscopy (PiFM) scattering NSOM (s-NSOM).
33. Time domain thermoreflectance (TDTR) measurement system.
34. Blue diode laser annealing system.
35. Laser-Assisted Chemical Vapor Deposition (LA-CVD) apparatus for growth of Si, Ge and III-V material. nanostructures at the UC Berkeley MARVELL nanofabrication facility. Various dopant gases are coupled into the apparatus.
36. Organic semiconductor patterning.
21. Semiconductor analyzer for device measurements.
22. Solar cell simulator for solar cell evaluation.
23. Lindberg nanowire growth furnace.
24. Carbon nanotube (CNT) growth furnace.
25. 12-bit FASTCAM high speed camera, 1,280X1,024 pixels @ 2,000 fps, 640X240 pixels @ 10,000 fps.
Experimental Setups at LTL include:
26. Amplified femtosecond laser-based micromachining system.
27. High repetition rate ultrafast laser micromachining.
28. Multi-photon polymerization apparatus.
29. Optical emission spectroscopy, Rayleigh scattering spectroscopy, laser-induced-fluorescence (LIF) for nanosecond and femtosecond laser materials interactions.
30. Pump-and-Probe ultra-fast optical diagnostics and time-resolved imaging.
31. AFM coupled with the femtosecond laser for apertureless NSOM nanomachining and imaging.
32. AFM/NSOM second harmonic generation (SHG), Photon-induced Force Microscopy (PiFM) scattering NSOM (s-NSOM).
33. Time domain thermoreflectance (TDTR) measurement system.
34. Blue diode laser annealing system.
35. Laser-Assisted Chemical Vapor Deposition (LA-CVD) apparatus for growth of Si, Ge and III-V material. nanostructures at the UC Berkeley MARVELL nanofabrication facility. Various dopant gases are coupled into the apparatus.
36. Organic semiconductor patterning.